Focused Ion Beam Milling

Focused Ion Beam Milling

Focused ion beam systems use a finely focused beam of ions (usually gallium) that can be operated at low beam currents for imaging or at high beam currents for site specific sputtering or milling.

Zeiss NVision 40 FIB-SEM


Zeiss Auriga FIB-SEM


Zeiss Crossbeam 540

The Zeiss Crossbeam 540 is a state of the art FIB/SEM system featuring the Zeiss Capella FIB column and Gemini II SEM column.  Funded by an EPSRC grant, the instrument is primed for both nanofabrication and analytical work.  For the latter, the system is fitted with the Oxford Instruments XMaxN 150 EDX detector and Nordlys Max EBSD system.  This will give the ability to acquire 3-dimensional datasets containing chemical and crystallographic data.

The system is also equippred for nanofabrication and serial cross sectional imaging using the advanced Zeiss Atlas 5 imaging and patterning engine, which can pattern complex 3D shapes and be used to create 3D image stacks with signals from multiple detectors.